Model-based opc using the meef matrix

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Web5 mei 2024 · OPC convergence improvement by matrix OPC solver on high MEEF contact layer Abstract: The use of dense pitch and single exposure process make 28nm contact … Web28 aug. 2003 · Abstract We use the gradient of the image slope and gradient of the edge placement error (EPE) in order to improve both slope and EPE during OPC. The EPE gradient taken with respect to edge position is normally called MEEF or the MEEF matrix.

Model-based OPC using the MEEF matrix - DeepDyve

WebModel-based OPC using the MEEF matrix II Proc. SPIE 9052, Optical ... The advancement in technology node requires continues updates to OPC modeling test … Web22 feb. 2024 · Model-based OPC using the MEEF matrix II. Article. Feb 2014; Proceedings of SPIE; ... This is an exquisite approach with regard to the contour-based OPC, for the model is calibrated directly from ... in harmony with翻译

Model-based OPC using the MEEF matrix - NASA/ADS

Web5 mei 2024 · OPC convergence improvement by matrix OPC solver on high MEEF contact layer Abstract: The use of dense pitch and single exposure process make 28nm contact layer known as one high MEEF (Mask Error Enhancement Factor) and low contrast layer, which also causes slow and poor OPC convergence. http://www.maojet.com.tw/files/PDF/EDA/Anchor_Detection%20of%20OPC%20Conflict%20Edges%20through%20MEEF%20Analysis.pdf WebThe EPE gradient taken with respect to edge position is normally called MEEF or the MEEF matrix. Use of the gradient of image slope with respect to change in edge position ... in … in harm\u0027s way 1965 plot

[PDF] A feasible model-based OPC algorithm using Jacobian …

OPC methods to improve image slope and process window

Web13 okt. 2011 · Model-based OPC using the MEEF matrix Nicolas B. Cobb, Y. Granik Computer Science Photomask Technology 2002 This paper covers the topic of matrix … Web_ _ Cobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Related U-s- Appllcatlon Data Matrix,” Proceedings of SPIE, vol. 4889: 22nd Annual BACUS ?led on Jan. 31, … mkj baltic oüWebWhat is claimed is: 1. A method, executed by at least one processor of a computer, comprising: receiving a layout design; performing a machine learning-based clustering … mkj buffalo group

"Web31 mrt. 2014 · Model-based OPC using the MEEF matrix II, Proceedings of SPIE 10.1117/12.2046635 DeepDyve Model-based OPC using the MEEF matrix II Lei, Junjiang; Hong, Le; Lippincott, George; Word, James Proceedings of SPIE, Volume 9052 – Mar 31, 2014 Read Article Download PDF Share Full Text for Free (beta) 9 pages Article … " - Model-based opc using the meef matrix

Model-based opc using the meef matrix

Web9052 0N Model-based OPC using the MEEF matrix II [9052-22] J. Lei, L. Hong, G. Lippincott, J. Word, Mentor Graphics Corp. (United States) iv. MULTIPLE PATTERNING … WebSPIE Digital Library Proceedings

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In matrix-OPC, we perform OPC edge movements, considering the cross-MEEF of all edges which affect the edge placement error (EPE) at each simulation site. This contrasts with standard model-based OPC methods. In the standard methods a simulation site is placed on each edge fragment. WebOPC SIMULATION MODELUSING SOCS DECOMPOSITION OF EDGE FRAGMENTS CROSS REFERENCE TO RELATED APPLICATIONS The present application is related …

Web28 feb. 2014 · Several algorithms have been proposed to minimize edge placement error (around wafer image contours) in model-based OPC. Mask error enhancement factor …

Web9052 0N Model-based OPC using the MEEF matrix II [9052-22] J. Lei, L. Hong, G. Lippincott, J. Word, Mentor Graphics Corp. (United States) iv. MULTIPLE PATTERNING AND SMO 9052 0O Immersion lithography extension to sub-10nm nodes with multiple patterning [9052-23] Web31 mrt. 2014 · Model-based OPC using the MEEF matrix II, Proceedings of SPIE 10.1117/12.2046635 DeepDyve Model-based OPC using the MEEF matrix II Lei, …

WebCobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Matrix.” Proceedings of SPIE, vol. 4889: 22nd Annual BACUSSym posium On Photomask Technology, …

Web31 mrt. 2014 · At the 20nm technology node, it is challenging for simple resolution enhancements techniques (RET) to achieve sufficient process margin due to significant coupling effects for dense features. Advanced computational lithography techniques including Source Mask Optimization (SMO), thick mask modeling (M3D), Model Based … mkj39170828 replaced service remote controlWeb27 dec. 2002 · In matrix-OPC, we perform OPC edge movements, considering the cross-MEEF of all edges which affect the edge placement error (EPE) at each simulation site. … mkj associates peshawar pakistanWebModel-based OPC using the MEEF matrix II. Citing article. Feb 2014; Junjiang Lei; Le Hong; George Lippincott; James Word; View... During the verification step, process variability bands or PVband ... in harmony youtubeWeb1 Detection of OPC Conflict Edges through MEEF Analysis . Li-Fu Chang1, Chang-IL Choi1, Guojie Cheng2, Abhishek Vikram 2, Gary Zhang2 . and Bo Su3 . 1Semiconductor … in harms 1965WebModel-based OPC using the MEEF matrix II. Author (s): Junjiang Lei Le Hong George Lippincott James Word. Format. Member Price. Non-Member Price. PDF. $17.00. $21.00. Add to cart. in harmony with造句WebModel-based OPC using the MEEF matrix II Author (s): Junjiang Lei Le Hong George Lippincott James Word Add to cart GOOD NEWS! Your organization subscribes to the … mk janaco ltd leo water pumpWeb26 aug. 2003 · Use of the gradient of image slope with respect to change in edge position was introduced by Granik as the "contrast matrix." Whereas traditional OPC techniques focus on EPE alone (pattern fidelity), we broaden the scope of OPC to maximize slope for improved image robustness and to maximize process window. in harm\u0027s way 1965 full movie online free